Maskless aligner

NTNU [The Norwegian University of Science and Technology]

We would like a quick system that can reveal photo resists on a number of bases that span from, e.g. 6 inch wafers to small samples. At the moment there are two alternatives to pattern a large selection of resistance in our clean room:
1. By using a mask aligner, which requires a photo mask to be designed and then sent to an external company for fabrication. The processing time for this alternative is normally 1 to 2 weeks, as the companies are mainly located abroad. As the design functions on the mask are often changed through an iterative process, it is necessary to order several masks with minor changes over time. The delivery time makes a bottleneck. The system that we are looking for shall be able to prototype a design quickly after direct exposure to resistance on a wafer, photo mask blank or other substrate of interest. The system ought to be able to take a certain press of existing mask aligners and, in order to do this, it is necessary to be quickly able to expose even large areas with high resolution (approx. 1 pm). Ideally, it ought to be able to take less than 20 minutes or so to expose a full 4 inch wafer on a micron solution with a very dense layout. This will give let our users order the proposed system instead of using mask aligners not only for prototyping, but also for day-to-day exposures. In addition, contrary to traditional mask aligners, a non-contact system will allow exposure of fine functions even when large aspect condition functions ought to be already present on the substrate.
2. The other alternative is our Elionix e-beam system. This system gives prototyping at extremely high resolutions; but it will be a misuse of properties and wasted time to use it for the relatively large functions that often make up a large part of a design. The proposed system ought, therefore, to allow a mix and match approach, in which major functions (one micrometer and upwards) can be quickly exposed on the bases for selection with the proposed system, and then put on a nanometer scale exactly in line with the existing functions, or vice versa.
We hope that the system opens up new options for research in clean rooms. We currently have a functioning alternative for backside adjustment, a function that is often used in, e.g. MEMS. The proposed system shall provide this, either with, or as a potential upgrade.
We expect that this system will create a lot of interest from a large user group. In addition to the technical specifications, user friendliness (minimal set-up, quick sample assembly, intuitive software, ability to add functions for exposure in situ) and low maintenance needs are the key for short user turnover and to reduce the time that NanoLab engineers have to use the system. Finally, systems with an existing User Base in our network with clean rooms at universities in Scandinavia or Europe will allow the exchange of experiences in both the process and maintenance, something we have found to be very valuable for other types of equipment.
See the attached technical specifications in annex 1 for further requirements for the procurement.

Frist
Fristen for mottak av tilbud var 2016-11-02. Anskaffelsen ble publisert 2016-09-27.

Hvem?

• • NTNU [The Norwegian University of Science and Technology]

Hva?

• • Laboratorie-, optisk- og presisjonsutstyr (bortsett fra briller)

Hvor?

• • Norge